Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985

Electron-beam X-ray and ion-beam techniques for submicrometer lithographies IV : March 14-15 1985

出版社：Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1985.

ISBN：089252572X

出版年：1985

作者：Blais,Phillip D.

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Electron-beam, x-ray and ion-beam techniques for submicrometer lithographies IV

作者：Blais,Phillip D.,
ISBN：089252572x
出版社：Bellingham : SPIE, 1985.
出版年：1985

Electron - beam, X - ray, and ion - beam techniques for submicrometer lithographies IV : March 14-15

作者：Blais,Phillip D.
ISBN：089252572X
出版社：Wash., c1985
出版年：1985

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 198

作者：Wagner,Alfred,
出版社：Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1984.
出版年：1984

Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, San

作者：Blais,Phillip D.
ISBN：089252667X
出版社：Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
出版年：1986

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, S

作者：Yanof,Arnold W.
ISBN：0819401242
出版社：Bellingham, Wash., USA : SPIE, c1989.
出版年：1989

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San

作者：Resnick,Douglas J.
ISBN：0819403105
出版社：Bellingham, Wash., USA : SPIE, c1990.
出版年：1990