Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, San

Electron-beam x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986 San

出版社：Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.

ISBN：089252667X

出版年：1986

作者：Blais,Phillip D.

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Electron-beam, x-ray and ion-beam techniques for submicrometer lithographies IV

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Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San

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出版年：1985

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